Cover of: Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing |

Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing

6-7 March 1991, San Jose, California
  • 340 Pages
  • 3.85 MB
  • 2230 Downloads
  • English

SPIE , Bellingham, Wash
Lithography, Electron beam -- Congresses., X-ray lithography -- Congresses., Ion beam lithography -- Congre
StatementMartin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
SeriesProceedings / SPIE--the International Society for Optical Engineering ;, v. 1465, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 1465.
ContributionsPeckerar, Martin Charles, 1946-, Society of Photo-optical Instrumentation Engineers.
Classifications
LC ClassificationsTK7874 .E4818 1991
The Physical Object
Paginationx, 340 p. :
ID Numbers
Open LibraryOL1569586M
ISBN 100819405647
LC Control Number91061058

CONFERENCE PROCEEDINGS Papers Presentations Journals. Advanced Photonics Journal of Applied Remote Sensing.

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CONFERENCE PROCEEDINGS Papers Presentations Journals. Advanced Photonics Journal of Applied Remote Sensing. CONFERENCE PROCEEDINGS Papers Presentations Journals. Advanced Photonics Journal of Applied Remote Sensing.